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SPIE Proceedings [SPIE 1988 Microlithography Conferences - Santa Clara, CA (Wednesday 2 March 1988)] Advances in Resist Technology and Processing V - Photobleachable Diazonium Salt-Phenolic Resin Two-Layer Resist System
Uchino, Shou-ichi, Iwayanagi, Takao, Hashimoto, Michiaki, MacDonald, Scott A.Volume:
920
Year:
1988
Language:
english
DOI:
10.1117/12.968307
File:
PDF, 2.65 MB
english, 1988