![](/img/cover-not-exists.png)
ChemInform Abstract: Effect of Oxygen on the Etch Rate of NF3 Discharges.
NORDHEDEN, K. J., VERDEYEN, J. T.Volume:
18
Journal:
ChemInform
DOI:
10.1002/chin.198705326
Date:
February, 1987
File:
PDF, 116 KB
1987