![](/img/cover-not-exists.png)
ChemInform Abstract: The Very High-Rate Plasma-Jet Dry Etching Technique.
BARDOS, L., BERG, S., BLOM, H.-O., BARKLUND, A. M.Volume:
21
Journal:
ChemInform
DOI:
10.1002/chin.199031330
Date:
July, 1990
File:
PDF, 136 KB
1990