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Deposition of Fluorine-Containing Thin Film by Atmospheric Pressure Plasma Jet and Film Surface Structural Transition
Ma, Wei-Chun, Lin, Chin-Ho, Huang, ChunVolume:
12
Language:
english
Journal:
Plasma Processes and Polymers
DOI:
10.1002/ppap.201400109
Date:
April, 2015
File:
PDF, 1.40 MB
english, 2015