Subthreshold energy electron beam annealing of tin-implanted silicon
Oak, A. M., Vavilov, V. S., Chukichev, M. V., Shpinel, V. S.Volume:
86
Language:
english
Journal:
Radiation Effects
DOI:
10.1080/01422448308209665
Date:
January, 1984
File:
PDF, 375 KB
english, 1984