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[IEEE 2003 IEEE International Symposium on Semiconductor Manufacturing. Conference Proceedings - San Jose, CA, USA (30 Sept.-2 Oct. 2003)] 2003 5th International Conference on ASIC. Proceedings (IEEE Cat. No.03TH8690) - Elimination of NPN C-E leakage yield loss in SiGe:C HBT BiCMOS technology through optimization of critical wet chemical wafer treatments
John, J.P., Haver, H.B., Keys, J.E., Lemanski, M.W.Year:
2003
Language:
english
DOI:
10.1109/issm.2003.1243314
File:
PDF, 252 KB
english, 2003