SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Integrated Circuit Metrology, Inspection, and Process Control VIII - 16 MB DRAM trench depth characterization using dome scatterometry
Hatab, Ziad R., Prins, Steven L., McNeil, John R., Naqvi, S. Sohail H., Bennett, Marylyn H.Volume:
2196
Year:
1994
Language:
english
DOI:
10.1117/12.174118
File:
PDF, 626 KB
english, 1994