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SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Dissolution characteristics optimization for chemically amplified positive resist
Itani, Toshiro, Iwasaki, Haruo, Fujimoto, Masashi, Kasama, Kunihiko, Nalamasu, OmkaramVolume:
2195
Year:
1994
Language:
english
DOI:
10.1117/12.175330
File:
PDF, 417 KB
english, 1994