SPIE Proceedings [SPIE Microelectronic Manufacturing - Austin, TX (Tuesday 18 October 1994)] Microelectronics Manufacturability, Yield, and Reliability - Effects of plasma-etching-induced gate oxide degradation on MOSFET's 1/f noise
Hu, Chun, Martin, Scott T., Worley, Eugene, White, Joe, Kjar, Ray, Li, Guann-pyng, Vasquez, Barbara, Kawasaki, HisaoVolume:
2334
Year:
1994
Language:
english
DOI:
10.1117/12.186741
File:
PDF, 298 KB
english, 1994