SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies IX - 20:1 projection soft x-ray lithography using trilevel resist
Jewell, Tanya E., Becker, M. M., Bjorkholm, John E., Bokor, Jeffrey, Eichner, Ludwig, Freeman, Richard R., Mansfield, William M., MacDowell, Alastair A., O'Malley, M. L., Raab, Eric L., Silfvast, WillVolume:
1263
Year:
1990
Language:
english
DOI:
10.1117/12.20173
File:
PDF, 641 KB
english, 1990