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SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V - Electron-beam and x-ray lithographic characteristics of the optical resist ARCH
Novembre, Anthony E., Tarascon-Auriol, Regine G., Nalamasu, Omkaram, Fetter, Linus A., Bolan, Kevin J., Knurek, Chester S., Muenzel, Norbert, Holzwarth, Heinz E., Warlaumont, John M.Volume:
2437
Year:
1995
Language:
english
DOI:
10.1117/12.209189
File:
PDF, 281 KB
english, 1995