SPIE Proceedings [SPIE Photomask Japan 1995 - Kanagawa, Japan (Thursday 20 April 1995)] Photomask and X-Ray Mask Technology II - Reflection masks for soft x-ray projection lithography
Ito, Masaaki, Soga, Takashi, Yamanashi, Hiromasa, Ogawa, Taro, Yoshihara, HideoVolume:
2512
Year:
1995
Language:
english
DOI:
10.1117/12.212759
File:
PDF, 437 KB
english, 1995