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SPIE Proceedings [SPIE Photomask Japan 1995 - Kanagawa, Japan (Thursday 20 April 1995)] Photomask and X-Ray Mask Technology II - Dependency of side-lobe effect of half-tone phase-shift mask on substrate material and topology and its solutions
Lim, Sung-Chul, Woo, Sang-Gyun, Han, Woo-Sung, Koh, Young-Bum, Lee, Moon-Yong, Yoshihara, HideoVolume:
2512
Year:
1995
Language:
english
DOI:
10.1117/12.212788
File:
PDF, 498 KB
english, 1995