SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Design-Process-Technology Co-optimization for Manufacturability X - Methodology for analyzing and quantifying design style changes and complexity using topological patterns
Capodieci, Luigi, Cain, Jason P., Cain, Jason P., Lai, Ya-Chieh, Gennari, Frank, Sweis, JasonVolume:
9781
Year:
2016
Language:
english
DOI:
10.1117/12.2220021
File:
PDF, 803 KB
english, 2016