SPIE Proceedings [SPIE 15th Annual BACUS Symposium on Photomask Technology and Management '95 - Santa Clara, CA (Wednesday 20 September 1995)] 15th Annual BACUS Symposium on Photomask Technology and Management - Repeatable mask metrology for next-generation lithography tools
Hentschel, Steve L., Kamberian, Henry H., Kovatch, Julius, Shelden, Gilbert V., Wiley, James N.Volume:
2621
Year:
1995
Language:
english
DOI:
10.1117/12.228170
File:
PDF, 249 KB
english, 1995