SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Optical Microlithography IX - Top-surface imaging and optical proximity correction: a way to 0.18-um lithography at 248 nm
Goethals, Anne-Marie, Vertommen, J., Van Roey, Frieda, Yen, Anthony, Tritchkov, Alexander V., Ronse, Kurt G., Jonckheere, Rik M., Van den Hove, Luc, Fuller, Gene E.Volume:
2726
Year:
1996
Language:
english
DOI:
10.1117/12.240910
File:
PDF, 1.09 MB
english, 1996