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SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Metrology, Inspection, and Process Control for Microlithography XI - Characterizing overlay registration of concentric 5X and 1X stepper exposure fields using interfield data
Goodwin, Francis G., Pellegrini, Joseph C., Jones, Susan K.Volume:
3050
Year:
1997
Language:
english
DOI:
10.1117/12.275927
File:
PDF, 724 KB
english, 1997