SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Metrology, Inspection, and Process Control for Microlithography XII - Monte Carlo simulations of electron-beam/solid interactions as an aid in interpretation of EDS and auger analysis of particles and defects
Kingsley, Jeffrey R., Harris, David W., Singh, BhanwarVolume:
3332
Year:
1998
Language:
english
DOI:
10.1117/12.308760
File:
PDF, 3.49 MB
english, 1998