SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Optical Microlithography XI - SEMATECH J111 project: OPC validation
Schellenberg, Franklin M., Zhang, Hua, Morrow, Jim, Van den Hove, LucVolume:
3334
Year:
1998
Language:
english
DOI:
10.1117/12.310719
File:
PDF, 3.24 MB
english, 1998