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SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - Novel approach for the photostabilization of chemically amplified photoresists
Carpio, Ronald A., Martinez, Roy A., Mohondro, Robert D., Conley, WillVolume:
3678
Year:
1999
Language:
english
DOI:
10.1117/12.350145
File:
PDF, 750 KB
english, 1999