SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - Polymer-platform-dependent characteristics of 193-nm photoresists
Opitz, Juliann, Allen, Robert D., Breyta, Gregory, Hofer, Donald C., Sundararajan, Narayan, Ober, Christopher K., Conley, WillVolume:
3678
Year:
1999
Language:
english
DOI:
10.1117/12.350161
File:
PDF, 1.71 MB
english, 1999