SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - Screening of DNQ/novolac resists with e-beam exposure
Fedynyshyn, Theodore H., Doran, Scott P., Lind, Michele L., Lyszczarz, Theodore M., DiNatale, William F., Lennon, Donna, Sauer, Charles A., Meute, Jeff, Conley, WillVolume:
3678
Year:
1999
Language:
english
DOI:
10.1117/12.350180
File:
PDF, 1.32 MB
english, 1999