SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Emerging Lithographic Technologies III - Sub-100-nm lithographic imaging with an EUV 10X microstepper
Goldsmith, John E. M., Berger, Kurt W., Bozman, Dan R., Cardinale, Gregory F., Folk, Daniel R., Henderson, Craig C., O'Connell, Donna J., Ray-Chaudhuri, Avijit K., Stewart, Kenneth D., Tichenor, DanieVolume:
3676
Year:
1999
Language:
english
DOI:
10.1117/12.351097
File:
PDF, 2.85 MB
english, 1999