SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Emerging Lithographic Technologies III - EUV mask patterning approaches
Yan, Pei-yang, Zhang, Guojing, Kofron, Patrick, Chow, Jenn, Stivers, Alan R., Tejnil, Edita, Cardinale, Gregory F., Kearney, Patrick A., Vladimirsky, YuliVolume:
3676
Year:
1999
Language:
english
DOI:
10.1117/12.351102
File:
PDF, 2.01 MB
english, 1999