SPIE Proceedings [SPIE Photomask and X-Ray Mask Technology VI - Yokohama, Japan (Tuesday 13 April 1999)] Photomask and X-Ray Mask Technology VI - Evaluation of the impact of pattern fidelity on photomask inspectability
Woolverton, Kevin S., Liu, Gang, Zwigl, Peter, Ruch, Wayne E., Morimoto, HiroakiVolume:
3748
Year:
1999
Language:
english
DOI:
10.1117/12.360247
File:
PDF, 297 KB
english, 1999