SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Development of an i-line attenuated phase shift process for dual inlay interconnect lithography
Sturtevant, John L., Ho, Benjamin C. P., Geiszler, Vincent C., Herrick, Matthew T., King, Charles F., Carter, Russell L., Roman, Bernard J., Litt, Lloyd C., Smith, Brad, Strozewski, Kirk J., Houlihan,Volume:
3999
Year:
2000
Language:
english
DOI:
10.1117/12.388335
File:
PDF, 2.23 MB
english, 2000