SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Optical Microlithography XIII - Dynamic performance of DUV step-and-scan systems and process latitude
Klaassen, Michel, Reuhman, Marian, Loock, Antoine, Rademaker, Mike, Gemen, Jack, Progler, Christopher J.Volume:
4000
Year:
2000
Language:
english
DOI:
10.1117/12.389070
File:
PDF, 338 KB
english, 2000