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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology VII - Kanagawa, Japan (Wednesday 12 April 2000)] Photomask and Next-Generation Lithography Mask Technology VII - In-line verification of linewidth uniformity for 0.18 and below: design rule reticles
Tan, TaiSheng, Kuo, Shen C., Wu, Clare, Falah, Reuven, Hemar, Shirley, Sade, Amikam, Gottlib, Gidon, Morimoto, HiroakiVolume:
4066
Year:
2000
Language:
english
DOI:
10.1117/12.392035
File:
PDF, 1.28 MB
english, 2000