![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE International Symposium on Optical Science and Technology - San Diego, CA (Sunday 30 July 2000)] Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries - New purged UV spectroscopic ellipsometer to characterize thin films and multilayers at 157 nm
Boher, Pierre, Evrard, Patrick, Piel, Jean-Philippe, Stehle, Jean-Louis P., Al-Jumaily, Ghanim A., Duparre, Angela, Singh, BhanwarVolume:
4099
Year:
2000
Language:
english
DOI:
10.1117/12.405821
File:
PDF, 1.07 MB
english, 2000