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SPIE Proceedings [SPIE Microelectronic Manufacturing - Santa Clara, CA (Monday 18 September 2000)] Process Control and Diagnostics - Real-time process control to prevent CD variation induced by postexposure delay
Ku, Chin-Yu, Lei, Tan F., Shieh, Jia-Min, Chiou, Tsann-Bim, Chen, Yung-Cheng, Miller, Michael L., Ashtiani, Kaihan A.Volume:
4182
Year:
2000
Language:
english
DOI:
10.1117/12.410094
File:
PDF, 189 KB
english, 2000