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SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - Random pattern formation by attenuated non-phase-shift assist pattern mask
Nakao, Shuji, Tokui, Akira, Tsujita, Kouichirou, Arimoto, Ichiriou, Wakamiya, Wataru, Progler, Christopher J.Volume:
4346
Year:
2001
Language:
english
DOI:
10.1117/12.435777
File:
PDF, 2.98 MB
english, 2001