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SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Emerging Lithographic Technologies V - Evaluation and comparison of the pattern-transfer-induced image placement distortions on e-beam projection lithography masks
Magg, Christopher, Lercel, Michael J., Lawliss, Mark, Ackel, Robin, Caldwell, Neal, Kindt, Louis, Racette, Kenneth C., Williams, Carey T., Reu, Phillip L., Dobisz, Elizabeth A.Volume:
4343
Year:
2001
Language:
english
DOI:
10.1117/12.436664
File:
PDF, 859 KB
english, 2001