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SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Metrology, Inspection, and Process Control for Microlithography XV - Optimization of segmented alignment marks for advanced semiconductor fabrication processes
Wu, Qiang, Lu, Zhijian G., Williams, Gary, Zach, Franz X., Liegl, Bernhard, Sullivan, Neal T.Volume:
4344
Year:
2001
Language:
english
DOI:
10.1117/12.436746
File:
PDF, 585 KB
english, 2001