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SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Advances in Resist Technology and Processing XVIII - 193 SLR system based on COMA/acryl hybrid system
Yamamoto, Masafumi, Murata, Kiyoshi, Ishii, Hiroyuki, Ebata, Satoshi, Kajita, Toru, Shimokawa, Tsutomu, Houlihan, Francis M.Volume:
4345
Year:
2001
Language:
english
DOI:
10.1117/12.436839
File:
PDF, 245 KB
english, 2001