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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology VIII - Kanagawa, Japan (Wednesday 25 April 2001)] Photomask and Next-Generation Lithography Mask Technology VIII - Resolution improvement of chemical-amplification resist using process-induced effect correction
Choi, Ji-Hyeon, Kim, Chang-Hwan, Lee, Jeong-Yun, Moon, Seong-Yong, Choi, Seong-Woon, Han, Woo-Sung, Sohn, Jung-Min, Kawahira, HiroichiVolume:
4409
Year:
2001
Language:
english
DOI:
10.1117/12.438359
File:
PDF, 278 KB
english, 2001