SPIE Proceedings [SPIE Photomask 2001 - Monterey, CA (Wednesday 3 October 2001)] 21st Annual BACUS Symposium on Photomask Technology - Mask-related distortions of modified fused silica reticles for 157-nm lithography
Mikkelson, Andrew R., Abdo, Amr Y., Cotte, Eric P., Sohn, Jaewoong, Engelstad, Roxann L., Lovell, Edward G., Dao, Giang T., Grenon, Brian J.Volume:
4562
Year:
2002
Language:
english
DOI:
10.1117/12.458256
File:
PDF, 819 KB
english, 2002