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SPIE Proceedings [SPIE Advances in Resist Technology and Processing VIII - San Jose, United States (Monday 4 March 1991)] Advances in Resist Technology and Processing VIII - Dissolution inhibition mechanism of ANR photoresists: crosslinking vs. -OH site consumption
Thackeray, James W., Orsula, George W., Rajaratnam, Martha M., Sinta, Roger F., Herr, Daniel J., Pavelchek, Edward K., Ito, HiroshiVolume:
1466
Year:
1991
Language:
english
DOI:
10.1117/12.46357
File:
PDF, 863 KB
english, 1991