SPIE Proceedings [SPIE Advances in Resist Technology and Processing VIII - San Jose, United States (Monday 4 March 1991)] Advances in Resist Technology and Processing VIII - Novel base-generating photoinitiators for deep-UV lithography
Kutal, Charles, Weit, Scott K., Allen, Robert D., MacDonald, Scott A., Willson, C. Grant, Ito, HiroshiVolume:
1466
Year:
1991
Language:
english
DOI:
10.1117/12.46384
File:
PDF, 263 KB
english, 1991