SPIE Proceedings [SPIE Photomask Technology 2002 - Monterey, CA (Tuesday 1 October 2002)] 22nd Annual BACUS Symposium on Photomask Technology - Mask Error Enhancement-Factor (MEEF) metrology using automated scripts in CATS
van Adrichem, Paul J. M., Driessen, Frank A. J. M., van Hasselt, Kees, Brueck, Hans-Juergen, Grenon, Brian J., Kimmel, Kurt R.Volume:
4889
Year:
2002
Language:
english
DOI:
10.1117/12.467755
File:
PDF, 151 KB
english, 2002