SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Optical Microlithography XV - Tuning and simulating a 193-nm resist for 2D applications
Howard, William B., Wiaux, Vincent, Ercken, Monique, Bui, Bang, Byers, Jeff D., Pochkowski, Mike, Yen, AnthonyVolume:
4691
Year:
2002
Language:
english
DOI:
10.1117/12.474499
File:
PDF, 270 KB
english, 2002