SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Optical Microlithography XV - Implementation of phase-shift focus monitor with modified illumination
Nakao, Shuji, Maejima, Shinroku, Ueno, Atsushi, Yamashita, Shigenori, Miyazaki, Junji, Tokui, Akira, Tsujita, Kouichirou, Arimoto, Ichiriou, Yen, AnthonyVolume:
4691
Year:
2002
Language:
english
DOI:
10.1117/12.474643
File:
PDF, 346 KB
english, 2002