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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology IX - Yokohama, Japan (Tuesday 23 April 2002)] Photomask and Next-Generation Lithography Mask Technology IX - Development of hard pellicle for 157 nm
Okada, Kaname, Ootsuka, K., Ishikawa, I., Ikuta, Yoshiaki, Kojima, H., Kawahara, T., Minematsu, T., Mishiro, H., Kikugawa, Shinya, Sasuga, Y., Kawahira, HiroichiVolume:
4754
Year:
2002
Language:
english
DOI:
10.1117/12.476971
File:
PDF, 1.18 MB
english, 2002