SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology IX - Yokohama, Japan (Tuesday 23 April 2002)] Photomask and Next-Generation Lithography Mask Technology IX - Imaging capability of low-energy electron-beam proximity projection lithography toward the 70-nm node
Nakano, Hiroyuki, Oguni, Kumiko, Nohdo, Shinichiro, Koike, Kaoru, Moriya, Shigeru, Kawahira, HiroichiVolume:
4754
Year:
2002
Language:
english
DOI:
10.1117/12.476996
File:
PDF, 773 KB
english, 2002