SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Emerging Lithographic Technologies VII - Development of Xe-filled capillary discharge extreme-ultraviolet radiation source for semiconductor lithography
Teramoto, Yusuke, Sato, Hiroto, Bessho, Kazunori, Miyauchi, Koji, Ikeuchi, Mitsuru, Okubo, Keisuke, Yoshioka, Masaki, Toyoda, Koichi, Engelstad, Roxann L.Volume:
5037
Year:
2003
Language:
english
DOI:
10.1117/12.483704
File:
PDF, 755 KB
english, 2003