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SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Emerging Lithographic Technologies VII - Resist evauation at 50 nm in the EUV using interferometric spatial-frequency-doubled imaging
Shumway, Michael D., Naulleau, Patrick P., Goldberg, Kenneth A., Snow, Eric L., Bokor, Jeffrey, Engelstad, Roxann L.Volume:
5037
Year:
2003
Language:
english
DOI:
10.1117/12.484677
File:
PDF, 318 KB
english, 2003