SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Emerging Lithographic Technologies VII - Development of an experimental EUV interferometer for benchmarking several EUV wavefront metrology schemes
Murakami, Katsuhiko, Saito, Jun, Ota, Kazuya, Kondo, Hiroyuki, Ishii, Mikihiko, Kawakami, Jun, Oshino, Tetsuya, Sugisaki, Katsumi, Zhu, Yucong, Hasegawa, Masanobu, Sekine, Yoshiyuki, Takeuchi, Seiji,Volume:
5037
Year:
2003
Language:
english
DOI:
10.1117/12.484935
File:
PDF, 221 KB
english, 2003