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SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Metrology, Inspection, and Process Control for Microlithography XVII - Development of a polymer etch rate monitor: design, characterization, and application
Wang, Heping, Toddy, Terry, Gibbons, Stephen, May, Trisha, Herr, Daniel J.Volume:
5038
Year:
2003
Language:
english
DOI:
10.1117/12.485000
File:
PDF, 243 KB
english, 2003