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SPIE Proceedings [SPIE Advanced Microelectronic Manufacturing - Santa Clara, CA (Sunday 23 February 2003)] Process and Materials Characterization and Diagnostics in IC Manufacturing - Characterization and reduction of copper chemical-mechanical-polishing-induced scratches
Teo, Tai Yong, Goh, Wang Ling, Leong, Lup San, Lim, Victor S. K., Tse, Tak Yan, Chan, Lap, Tobin, Jr., Kenneth W., Emami, IrajVolume:
5041
Year:
2003
Language:
english
DOI:
10.1117/12.485223
File:
PDF, 366 KB
english, 2003