SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Data Analysis and Modeling for Process Control - Improvement of 90nm KrF Cu process window by minimizing via deformation caused by low-frequency resonance of scanner projection lens
Fang, Shu-Ping, Tobin, Jr., Kenneth W., Lin, Benjamin S., Hung, Kuei-ChunVolume:
5378
Year:
2004
Language:
english
DOI:
10.1117/12.535046
File:
PDF, 510 KB
english, 2004