SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Material origins of line-edge roughness: Monte Carlo simulations and scaling analysis
Patsis, George P., Sturtevant, John L., Constantoudis, Vassilios, Gogolides, EvangelosVolume:
5376
Year:
2004
Language:
english
DOI:
10.1117/12.535202
File:
PDF, 334 KB
english, 2004